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ϣh(hun)Ƽ(yng)޹˾ > ԭo > XP2100C}FP͏(f)τ (yng)ϣ }P

XP2100C}FP͏(f)τ (yng)ϣ }P

  • XP2100C}FP͏(f)τ (yng)ϣ }P
  • XP2100C}FP͏(f)τ (yng)ϣ }PS
  • ӆ؛ǧˣ

    r(ji)񣨲

  • 25

    55.00Ԫ/ǧ

  • 185

    52.00Ԫ/ǧ

  • 1000

    50.00Ԫ/ǧ

  • (yng)(bio)}XP2100C}FP͏(f)τ (yng)ϣ }P

    r(ji)늃x

    l(f)˾ϣh(hun)Ƽ(yng)޹˾

    ؛999999

    “(lin)ϵˣwŮʿ

    l(f)؛c(din) (yng) ^(q)

    l(f)r(sh)g20240112

    Ч20250903

    ھԃ

    ھԃPھԃP

    a(chn)ƷCϢ|(zh)δӋ(j)

ܰѣՈ(qng)M(fi)Ì(du)(gu)HķߴʩƷҪM(jn)ƷCһ(bo)棨؛SC뾳zCA(y)C¹ڲzy(c)(bo)棩

鿴ͬa(chn)Ʒ

44147
  • Ʒƣϣ
  • ̖(ho)XP2100C
  • ܣ
  • ;}FP͏(f)τP͏(f)ӄ}P͏(f)τ
  • 5
  • ܣǽ컯b蹤̲ϵĺ(jin)Q߂䃞(yu)͸g

    ;C(j)еxܵ͘(gu)

    ӢChemical Materials

    P(gun)]

    Ϣ

    XP2100

    }FP͏(f)τ

    XP2100}FP͏(f)τ

    a(chn)Ʒf

    ?XP2100^ˮÓQͷP(f)τڵVͼ܄УγɱϞ?zi)ṩ?yu)ԽˮÓQcP

    ?XP2100ͨ^ASTM B-117}Fԇ(yn)r(sh)g_(d)96Сr(sh)}Fh(hun)ṩ(yu)ԽķP

    ?XP2100ճ(du)ɫټ󲿷ɫٲg

    ?XP2100ڭh(hun)ʯϞͼN܄У5%-25%

    ?XP2100mڽnˢͿ͇F

    ?XP2100ͨ^M(jn)ϞĽMЧĽ˂y(tng)P͵Ěζ

    ͔(sh)(j)

    ^25棩 ɫϞw

    ܶȣ15棩 0.92

    Wc(din) >160

    c(din) 45

    ֵ mg KOH/g 12

    ܽdw V͡ú܄

    XP2100 -----------8-20%

    V ----------5-20%

    ܄ -----------60-82%

    8%(bio)(zhn)}Fԇ(yn)48Сr(sh)

    ϣh(hun)Ƽ(yng)޹˾Ϣ

    ϣh(hun)Ƽ(yng)޹˾һҌT­h(hun)ՃϡI(y)ӄԼܻW(xu)Ʒаl(f)N۵Ĺ˾жĘI(y)(jng)(yn)ͺYԴ(yu)(sh)͑xԃr(ji)ȵĮa(chn)Ʒm˵ĽQԼƵķ(w)֧֡ ϣϣѵ󡱣ϣƼڴɞҌ(sh)Ѻͺ顣@҂˾ijҲ҂һ؞(jin)ֵĽ(jng)I(yng)‘B(ti)ȡ҂\(chng)(sh)ڄ¿(hu)õ؈(bo)҂Ŀ(bio)dzɞӯĹ˾ڴɞ͑MK(sh)F(xin)c͑pAԼc(yng)̵pA

    XP2100C}FP͏(f)τ (yng)ϣ }P


    a(chn)Ʒԣ
    Ӌ(j)λǧ ؛999999 Сӆ25 a(chn)Ʒ΃r(ji)55.00 Ʒƣ Ҏ(gu)̖(ho) bf

    XP2100C}FP͏(f)τ (yng)ϣ }Pa(chn)Ʒśr

    nbsp;ϣchemicalengineeringmaterials컯b蹤̲ϵĺ(jin)QMɻa(chn)bõĻC(j)еxܵ͘(gu)ﶼڲͬض͙C(j)еؓ(f)\(yn)D(zhun)|ֶЏ(qing)gáϳ(yng)һ㹤̲ϵ⣬߀(yng)߂䃞(yu)͸g͸gֱܲӰbõĉЕr(sh)߀(zi)ը¹߀(hu)Ӱ푮a(chn)ƷĮa(chn)|(zh)(j)ͬ;ʹ×lЕr(sh)߀Ҫ󻯹Ͼ͸ߜػ͵͜ء(do)ڻa(chn)Ϻ͹ˇlͬϵƷN̖࣬(ho)Ҏ(gu)(f)sȰһ㹤̲ϣҲbÌõľ;IJ
    (yng)

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