* (xing) P(gun)]
XP2100C}FP͏(f)τ (yng)ϣ }P
ӆ؛ǧˣ
r(ji)
25
55.00Ԫ/ǧ
185
52.00Ԫ/ǧ
1000
50.00Ԫ/ǧ
(yng)(bio)}XP2100C}FP͏(f)τ (yng)ϣ }P
r(ji)늃x
l(f)˾ϣh(hun)Ƽ(yng)˾
؛999999
(lin)ϵˣwŮʿ
l(f)؛c(din) (yng) ^(q)
l(f)r(sh)g20240112
Ч20250903
ھԃPھԃP
a(chn)ƷCϢ|(zh)δӋ(j)
Ϣ
XP2100
}FP͏(f)τ
XP2100}FP͏(f)τ
a(chn)Ʒf
?XP2100^ˮÓQͷP(f)τڵVͼ܄УγɱϞ?zi)ṩ?yu)ԽˮÓQcP
?XP2100ͨ^ASTM B-117}Fԇ(yn)r(sh)g_(d)96Сr(sh)}Fh(hun)ṩ(yu)ԽķP
?XP2100ճ(du)ɫټɫٲg
?XP2100ڭh(hun)ʯϞͼN܄У5%-25%
?XP2100mڽnˢͿ͇F
?XP2100ͨ^M(jn)ϞĽMЧĽ˂y(tng)P͵Ěζ
͔(sh)(j)
^25棩 ɫϞw
ܶȣ15棩 0.92
Wc(din) >160
c(din) 45
ֵ mg KOH/g 12
ܽdw V͡ú܄
䷽
XP2100 -----------8-20%
V ----------5-20%
܄ -----------60-82%
8%(bio)(zhn)}Fԇ(yn)48Сr(sh)
ϣh(hun)Ƽ(yng)˾Ϣ
ϣh(hun)Ƽ(yng)˾һҌTh(hun)ՃϡI(y)ӄԼܻW(xu)Ʒаl(f)N۵Ĺ˾жĘI(y)(jng)(yn)ͺYԴ(yu)(sh)͑xԃr(ji)ȵĮa(chn)Ʒm˵ĽQԼƵķ(w)֧֡ ϣϣѵϣƼڴɞҌ(sh)Ѻͺ顣@҂˾ijҲ҂һ؞(jin)ֵĽ(jng)I(yng)B(ti)ȡ҂\(chng)(sh)ڄ¿(hu)õ؈(bo)҂Ŀ(bio)dzɞӯĹ˾ڴɞ͑MK(sh)F(xin)c͑pAԼc(yng)̵pA
XP2100C}FP͏(f)τ (yng)ϣ }P
a(chn)Ʒԣ
Ӌ(j)λǧ ؛999999 Сӆ25 a(chn)Ʒr(ji)55.00 Ʒƣ Ҏ(gu)̖(ho) bf